A Tough Silicon Nitride Ceramic with High Thermal
Silicon nitride was fabricated by tape casting of α-Si 3 N 4 powder with 5 wt% Y 2 O 3 and 5 vol% rodlike β-Si 3 N 4 seed particles, followed by tape stacking, hot pressing under 40 MPa, and annealing at 1850°C for 2-66 h under a nitrogen pressure of 0.9 MPa. Silicon nitrides fabricated by this procedure exhibited a highly anisotropic microstructure with large elongated grains (developed ...
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